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Hybrid organic/silicon-based coatings were deposited on Al 99.99%
substrates using three different techniques: wet deposition, atmospheric
plasma and vacuum plasma. Spectroscopic Ellipsometry, infrared (IRSE)
and visual (VISSE), Fourier-transform Infrared Spectroscopy (FT-IR),
X-Ray Photoelectron Spectroscopy (XPS) and Field Emission Auger Electron
Spectroscopy (FE-AES) were used to investigate film structure, chemical
composition and surface morphology. Preliminary analysis of the coating
solutions was performed with Nuclear Magnetic Resonance (NMR) and
Dynamic Light Scattering (DLS).
Dip coating was used to deposit Bis-1,2-(TriethoxySilyl)Ethane (BTSE)
layers with inclusion of CeO2 nanoparticles for added functional
properties. SEM micrographs and AES depth profiles showed the ceria
distribution and agglomeration in the layers.
Plasma-polymerized films from BTSE were deposited on aluminium by
atmospheric plasma. Both XPS and infrared measurements revealed the
presence of silicon under Si-O state.
Inductively coupled radio frequency glow discharge plasma was used for
the deposition of plasma-polymerized film from hexamethyldisiloxane (HMDSO).
The deposited films consist of groups such as Si-O-Si, Si-CH3, and CH3.
They can be considered as polymer-like coatings, comparable to the
silane layers obtained by the deposition methods described above. |